@TechReport{N.v.d.Meijs_11_2007,
   author = "N.v.d. Meijs and Y. Bi and K-J.v.d. Kolk and D. Ioan and G. Ciuprina and A. Stefanescu and D. Niculae and W.H.A. Schilders and R. Janssen and J. Niehof and L. Miguel Silveira and Jorge F. Villena and W. Schoenmaker and A. Steinmair",
   title = "{CHAMELEON} {RF} {D2}.2 - Report on modeling for lithography and process induced variability",
   institution = "INESC-ID",
   number = 35,
   year = 2007,
   month = nov,
   BibTexOrigem = "6415 www.Inesc-ID.pt 2019-01-20"
}





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